Affirm Journal of Chemical Vapor Disposition

Affirm Journal of Chemical Vapor Disposition is an international and peer-reviewed journal with an intercontinental advisory board. The journal documents the professional’s interest in any areas that connect to chemical vapor disposition. The focus of the journal is on theories and practice in physical characteristics of vapor, low pressure chemical vapor deposition, plasma-assisted chemical, chemical vapor infiltration, and microfabrication. The editorial board of the Affirm Journal of Chemical Vapor Disposition invites authors to submit original papers, case studies and review papers to the journal. At Affirm Journal of Chemical Vapor Disposition, we expect the authors to abide Principles of Transparency and Best Practice in Scholarly Publishing suggested by The Committee on Publication Ethics (COPE), the Directory of Open Access Journals (DOAJ), the Open Access Scholarly Publishers Association (OASPA), and Scopus.

Scope and Focus

Chemical Beam Epitaxy
Chemical Vapor Deposition
Chemical Vapor Infiltration
Laser Chemical Vapor Deposition
Low Pressure Chemical Vapor Deposition
Metal-Organic Chemical Vapor Deposition
Photochemical Vapor Deposition
Physical Characteristics of Vapor
Plasma-Assisted Chemical
Substrate Heating

Editor in chief

Dr. Loghman

Abstracting and Indexing

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